In situ ellipsometry analysis on formation process of Al2O 3-Ta2O5 films in ion beam sputter deposition

Journal of the Electrochemical Society

Volumn 152, Issue 4, 2005, Pages

  Kaneko, Tetsuji ^a,b   Noboru, Akao ^a   Hara, Nobuyoshi ^a   Sugimoto, Katsuhisa ^a,c  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALI METALS; AUGER ELECTRON SPECTROSCOPY; ELLIPSOMETRY; IN SITU PROCESSING; ION BEAMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CATIONIC FRACTION; ION BEAM SPUTTER DEPOSITION (IBSD); SURFACE FILMS; TRANSFER MECHANISMS;

ALUMINUM COMPOUNDS;

EID: 18344393987     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1861173     Document Type: Article

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