Formation of Al2O3-Ta2O5 Double-Oxide Thin Films by Low-Pressure MOCVD and Evaluation of Their Corrosion Resistances in Acid and Alkali Solutions

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 510-516

  Hara, Nobuyoshi ^a   Nagata, Shintaro ^a   Akao, Noboru ^a   Sugimoto, Katsuhisa ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS FILMS; CAUSTIC SODA; CORROSION RESISTANCE; DISSOLUTION; ELLIPSOMETRY; HYDROCHLORIC ACID; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TANTALUM COMPOUNDS; THIN FILMS;

TANTALUM PENTOXIDE;

PROTECTIVE COATINGS;

EID: 0033076992     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391636     Document Type: Article

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