Epitaxial properties of Al-doped ZnO thin films grown by pulsed laser deposition on SrTiO 3(001)

Physical Review B - Condensed Matter and Materials Physics

Volumn 71, Issue 7, 2005, Pages

  Karger, M ^a   Schilling, M ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ZINC OXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON DIFFRACTION; FILM; GEOMETRY; LASER; SURFACE PROPERTY; TEMPERATURE; X RAY DIFFRACTION;

EID: 15744371472     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.71.075304     Document Type: Article

References (28)

1. E. M. Kaidashev, M. Lorenz, H. von Wenckstern, A. Rahm, H.-C. Semmelhack, K.-H. Han, G. Benndorf, C. Bundesmann, H. Hochmuth, and M. Grundmann, Appl. Phys. Lett. 82, 3901 (2003).
2. H. J. Ko, Y. F. Chen, and T. Yao, Appl. Phys. Lett. 77, 537 (2000).
3. D. M. Bagnall, Y. F. Chen, M. Y. Shen, Z. Zhu, T. Goto, and T. Yao, J. Cryst. Growth 184, 605 (1998).
4. D. Gerthsen, D. Litvinov, T. Gruber, C. Kirchner, and A. Waag, Appl. Phys. Lett. 81, 3972 (2002).
5. M. Birkholz, B. Selle, F. Fenske, and W. Fuhs, Phys. Rev. B 68, 205414 (2003).
6. S. Hayamizu, H. Tabata, H. Tanaka, and T. Kawai, J. Appl. Phys. 80, 787 (1996).
7. S.-K. Hong, T. Hanada, H. Ko, Y. Chen, T. Yao, D. Imai, K. Arak, M. Shinohara, K. Saitoh, and M. Terauchi, Phys. Rev. B 65, 115331 (2002).
8. M. Joseph, H. Tabata, and T. Kawai, Appl. Phys. Lett. 74, 2534 (1999).
9. P. Fons, K. Iwata, A. Yamada, K. Matsubara, and S. Niki, Appl. Phys. Lett. 77, 1801 (2000).
10. W. Prellier, A. Fouchet, B. Mercey, C. Simon, and B. Raveau, Appl. Phys. Lett. 82, 3490 (2003).
11. V. Srikant and D. R. Clarke, J. Appl. Phys. 81, 6357 (1996).
12. H. Amano, M. Iwaya, T. Kashima, M. Katsuragama, I. Akasaki, J. Han, S. Hearne, J. Floro, E. Chason, and J. Figiel, Jpn. J. Appl. Phys., Part 2 37, L1540 (1998).
13. T. Nakamura, H. Minoura, and H. Muto, Thin Solid Films 405, 109 (2002).
14. A. Hachigo, H. N. K. Higaki, S. Fujii, and S. Shikata, Appl. Phys. Lett. 65, 2556 (1994).
15. R. Rauer, J. Bäckström, D. Budelmann, M. Kurfiß, M. Schilling, M. Rübenhausen, T. Walter, K. Dörr, and S. L. Cooper, Appl. Phys. Lett. 81, 3777 (2000).
16. Z. Y. Ning, S. H. Cheng, S. B. Ge, Y. Chao, Y. X. Zhang, and Z. G. Liu, Thin Solid Films 307, 50 (1997).
17. A. V. Singh, R. M. Mehra, N. Buthrath, A. Wakahara, and A. Yoshida, J. Appl. Phys. 90, 5661 (2001).
18. J. H. Kim, H. Kim, D. Kim, Y. E. Ihm, and W. K. Choo, J. Appl. Phys. 92, 6066 (2002).
19. J.-K. Heinsohn, D. Reimer, A. Richter, K.-O. Subke, and M. Schilling, Physica C 299, 99 (1999).
20. G. Koster, B. L. Kropman, G. J. H. M. Rijnders, D. H. A. Blank, and H. Rogalla, Appl. Phys. Lett. 73, 2920 (1998).
21. B. M. Ataev, W. V. Lundin, V. V. Mamedov, A. M. Bagamadova, and E. E. Zavarin, J. Phys.: Condens. Matter 13, 211 (2001).
22. D. H. A. Blank, G. Koster, G. Rijnders, E. van Setten, P. Slycke, and H. Rogalla, Appl. Phys. A: Mater. Sci. Process. A69, 17 (1999).
23. D. A. H. Blank, G. J. H. M. Rijnders, G. Koster, and H. Rogalla, Appl. Surf. Sci. 139, 17 (1999).
24. D. Litvinov, T. O'Donnel, and R. Clarke, J. Appl. Phys. 85, 2151 (1999).
25. Landolt-Börnstein, New Series Group III (Springer, Berlin, 1996), Vol. 17.
26. Landolt-Börnstein, New Series Group III (Springer, Berlin, 1996), Vol. 16a.
27. B. D. Culity and S. R. Stock, Elements of X-ray Diffraction, 3rd ed. (Pearson Education International, New Jersey, 2001), Chap. 3.
28. J. Narayan and B. C. Larson, J. Appl. Phys. 93, 278 (2003).