Ferroelectric behavior of Li-doped ZnO thin films on Si(100) by pulsed laser deposition

Applied Physics Letters

Volumn 74, Issue 17, 1999, Pages 2534-2536

  Joseph, M ^a   Tabata, H ^a   Kawai, T ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; FERROELECTRIC MATERIALS; MORPHOLOGY; PHASE TRANSITIONS; PULSED LASER APPLICATIONS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; X RAY CRYSTALLOGRAPHY; ZINC OXIDE;

PULSED LASER DEPOSITION (PLD) METHOD;

DIELECTRIC FILMS;

EID: 0032620188     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123889     Document Type: Article

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