Antireflection sub-wavelength gratings fabricated by spin-coating replication

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 287-293

  Kanamori, Y ^a   Roy, E ^b   Chen, Y ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b CNRS   (France)

Author keywords

Antireflection; Mold; Nanoimprint lithography; Polymethyl methacrylate; Replication; Rigorous coupled wave analysis; Subwavelength gratings

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FUNGI; LIGHT EMITTING DIODES; PHOTORESISTS; PHOTOVOLTAIC CELLS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SPIN COATING;

NANOIMPRINT LITHOGRAPHY; REPLICATION; RIGOROUS COUPLED-WAVE ANALYSIS; SUBWAVELENGTH GRATINGS;

DIFFRACTION GRATINGS;

EID: 14944361883     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.039     Document Type: Conference Paper

References (29)

1. S.J. Wilson, and M.C. Hutley Opt. Acta 29 1982 993
2. R.C. Enger, and S.K. Case Appl. Opt. 22 1983 3220
3. Y. Ono, Y. Kimura, Y. Ohta, and N. Nishida Appl. Opt. 26 1987 1142
4. S.T. Han, Y.-L. Tsao, R.M. Walser, and M.F. Becker Appl. Opt. 31 1992 2343
5. P. Lalanne, and G.M. Morris Proc. SPIE 2776 1996 300
6. S.H. Zaidi, A.-S. Chu, and S.R.J. Brueck J. Appl. Phys. 80 1996 6997
7. P. Lalanne, and G.M. Morris Nanotechnology 8 1997 53
8. A. Gombert, W. Glaubitt, K. Rose, J. Dreibholz, C. Zanke, B. Bläsi, A. Heinzel, W. Horbelt, D. Sporn, W. Döll, V. Wittwer, and J. Luther Sol. Energy 62 1998 177
9. D.L. Brundrett, T.K. Gaylord, and E.N. Glytsis Appl. Opt. 37 1998 2534
10. A. Gombert, W. Glaubitt, K. Rose, J. Dreibholz, B. Bläsi, A. Heinzel, D. Sporn, W. Döll, and V. Wittwer Thin Solid Films 351 1999 73
11. Y. Kanamori, M. Sasaki, and K. Hane Opt. Lett. 24 1999 1422
12. K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E.F. Wassermann Nanotechnology 11 2000 161
13. Y. Kanamori, H. Kikuta, and K. Hane Jpn. J. Appl. Phys. 39 2000 L735
14. Y. Kanamori, K. Hane, H. Sai, and H. Yugami Appl. Phys. Lett. 78 2001 142
15. C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke Microelectron. Eng. 61-62 2002 435
16. E.B. Grann, M.G. Moharam, and D.A. Pommet J. Opt. Soc. Am. A 12 1995 333
17. Y. Kanamori, M. Ishimori, and K. Hane IEEE Photon. Technol. Lett. 14 2002 1064
18. M. Ishimori, Y. Kanamori, M. Sasaki, and K. Hane Jpn. J. Appl. Phys. 41 2002 4346
19. Y. Kanamori, K. Kobayashi, H. Yugami, and K. Hane Jpn. J. Appl. Phys. 42 2003 4020
20. K. Kintaka, J. Nishii, A. Mizutani, H. Kikuta, and H. Nakano Opt. Lett. 26 2001 1642
21. S.Y. Chou, P.R. Krauss, and P.J. Renstrom Appl. Phys. Lett. 67 1995 3114
22. S.Y. Chou, P.R. Krauss, and P.J. Renstrom J. Vac. Sci. Technol. B 14 1996 4129
23. S.Y. Chou, and P.R. Krauss Microelectron. Eng. 35 1997 237
24. L. Guo, P.R. Krauss, and S.Y. Chou Appl. Phys. Lett. 71 1997 1881
25. P.R. Krauss, and S.Y. Chou Appl. Phys. Lett. 71 1997 3174
26. Z. Yu, S.J. Schablitsky, and S.Y. Chou Appl. Phys. Lett. 74 1999 2381
27. M.G. Moharam, and T.K. Gaylord J. Opt. Soc. Am. 71 1981 811
28. M.G. Moharam Proc. SPIE 883 1988 8
29. M.A. Macleod Thin-film Optical Filters second ed. 1986 Adam Hilger Ltd. Bristol