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Volumn 2776, Issue , 1996, Pages 300-309
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Design, fabrication, and characterization of subwavelength periodic structures for semiconductor antireflection coating in the visible domain
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Author keywords
[No Author keywords available]
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Indexed keywords
CHARACTERIZATION;
ETCHING;
FABRICATION;
HOLOGRAPHY;
LIGHT REFLECTION;
MULTILAYERS;
OPTICAL VARIABLES MEASUREMENT;
PRODUCT DESIGN;
SEMICONDUCTING SILICON;
SEMICONDUCTOR MATERIALS;
STRUCTURE (COMPOSITION);
THIN FILMS;
ANTIREFLECTION THIN FILMS;
REACTIVE ION ETCHING;
SEMICONDUCTOR ANTIREFLECTION COATINGS;
SUBWAVELENGTH PERIODIC STRUCTURES;
SUBWAVELENGTH STRUCTURES SURFACES;
ANTIREFLECTION COATINGS;
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EID: 0029769986
PISSN: None
EISSN: None
Source Type: None
DOI: 10.1117/12.246835 Document Type: Conference Paper |
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Times cited : (71)
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References (12)
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