Broadband antireflection gratings for glass substrates fabricated by fast atom beam etching

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 7, 2000, Pages

  Kanamori, Yoshiaki ^a   Kikuta, Hisao ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; FOURIER TRANSFORMS; GLASS; HELIUM NEON LASERS; MICROMACHINING; REFLECTION; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

ANTIREFLECTION; FAST ATOM BEAM; RIGOROUS COUPLED WAVE ANALYSIS; SUBWAVELENGTH GRATING;

DIFFRACTION GRATINGS;

EID: 0033632681     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l735     Document Type: Article

References (26)