Fabrication and optical properties of Er-doped multilayers Si-rich SiO 2/SiO2: Size control, optimum Er-Si coupling and interaction distance monitoring

Optical Materials

Volumn 27, Issue 5, 2005, Pages 868-875

  Gourbilleau, F ^a   Madelon, R ^a   Dufour, C ^a   Rizk, R ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY TRANSFER; ERBIUM; MULTILAYERS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; VLSI CIRCUITS;

COUPLING RATE; INTERACTION DISTANCE MONITORING; REACTIVE MAGNETRON SPUTTERING; SI-RICH SILICON OXIDE (SRSO);

SILICA;

EID: 13444257813     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.08.026     Document Type: Conference Paper

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