Optimized conditions for an enhanced coupling rate between Er ions and Si nanoclusters for an improved 1.54-μm emission

Journal of Applied Physics

Volumn 95, Issue 7, 2004, Pages 3717-3722

  Gourbilleau, F ^a   Levalois, M ^a   Dufour, C ^a   Vicens, J ^a   Rizk, R ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ERBIUM; GROWTH (MATERIALS); HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NUCLEATION; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

REACTIVE MAGNETRON SPUTTERING; ROOM TEMPEARTURE (RT);

SILICA;

EID: 1942446289     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1655680     Document Type: Article

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