Spectroscopic ellipsometry analyses of sputtered Si/SiO2 nanostructures

Journal of Applied Physics

Volumn 85, Issue 8 I, 1999, Pages 4032-4039

  Charvet, S ^a   Madelon, R ^a   Gourbilleau, F ^a   Rizk, R ^a  

^a LERMAT Laboratoire d'Etude et de Recherche sur les Materiaux   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; ELLIPSOMETRY; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON; SILICA; SPECTROSCOPIC ANALYSIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

FULL WIDTH AT HALF MAXIMUM (FWHM); HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); SPECTROSCOPIC ELLIPSOMETRY;

SEMICONDUCTING FILMS;

EID: 0032620453     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370307     Document Type: Article

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