Nanocomposite low-k SiCOH films by plasma-enhanced chemical vapor deposition using vinyltrimethylsilane and CO2

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2799-2803

  Jeong, Ki Hun ^a   Park, Sung Gyu ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; ELECTRODES; ELLIPSOMETRY; EVAPORATION; GROWTH KINETICS; NANOSTRUCTURED MATERIALS; OXYGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; REFRACTIVE INDEX; SILANES;

FILM THICKNESS; GROWTH RATES; VINYLTRIMETHYLSILANE (VTMS); WAVE NUMBERS;

SILICON COMPOUNDS;

EID: 13244299678     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1811628     Document Type: Article

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