Preparation and properties of silica films with higher-alkyl groups

Journal of Non-Crystalline Solids

Volumn 260, Issue 3, 1999, Pages 199-207

  Usami, Koh Ichi ^a   Sugahara, Satoshi ^a   Kobayashi, Mitsuo ^b   Sumimura, Kazuhito ^a   Hattori, Takeo ^b   Matsumura, Masakiyo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; ULSI CIRCUITS;

SILICA FILMS;

SEMICONDUCTING FILMS;

EID: 0033276959     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00577-3     Document Type: Article

References (11)

1. W.W. Lee, P.S. Ho, MRS Bull. 22 (1997) 19.
2. S. Bothra, I. Harvey, M. Weiling, in: Proceedings of the 14th International VLSI Multilevel Interconnection Conference, 1997, p. 134.
3. Y. Homma, T. Furusawa, K. Kusukawa, M. Nagasawa, Y. Nakamura, M. Saitou, in: Proceedings of the 12th International VLSI Multilevel Interconnection Conference, 1995, p. 457.
4. K. Usami, K. Sumimura, M. Matsumura, Jpn. J. Appl. Phys. 37 (4) (1998) L420.
5. K. Usami, S. Sugahara, K. Sumimura, M. Matsumura, MRS Symp. Proc. 511 (1998) 27.
6. K. Usami, S. Hayashi, Y. Uchida, M. Matsumura, Jpn. J. Appl. Phys. 37 (1) (1998) L97.
7. W.A. Coghlan, R.E. Clausing, Atomic Data 5 (1973) 317.
8. A.L. Smith, Spectrochim. Acta 16 (1960) 84.
9. P.A. Coon, M.L. Wise, A.C. Dillon, M.B. Robinson, S.M. George, J. Vac. Technol. B 10 (1) (1992) 221.
10. A.C. Dillon, M.B. Robinson, S.M. George, Surf. Sci. 286 (1993) L535.
11. P.A. Coon, M.L. Wise, Z.H. Walker, S. George, Surf. Sci. 291 (1993) 337.