Densification of radio frequency sputtered silicon oxide films by rapid thermal annealing

Journal of Applied Physics

Volumn 83, Issue 4, 1998, Pages 2308-2314

  Choi, W K ^a   Choo, C K ^a   Han, K K ^a   Chen, J H ^a   Loh, F C ^a   Tan, K L ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041656668     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366974     Document Type: Article

References (21)

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