Fabrication and characterization of silicon nanocrystals by thermal oxidation of a-Si:H films in air

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 2, 2003, Pages 719-728

  Kohli, Sandeep ^a   Theil, Jeremy A ^b   Snyder, Rick D ^b   Rithner, Christopher D ^a   Dorhout, Peter K ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b AGILENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; HYDROGENATION; MORPHOLOGY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON NANOCRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 0037279368     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1547749     Document Type: Article

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