Langmuir probe measurements in an inductively coupled plasma source

Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

Volumn 55, Issue 3, 1997, Pages 3450-3459

  Schwabedissen, A ^a   Benck, E C ^a   Roberts, J R ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; ELECTRODES; ELECTRON DENSITY MEASUREMENT; INERT GASES; NITROGEN; OXYGEN; PLASMA SOURCES; PROBES; TEMPERATURE MEASUREMENT;

EFFECTIVE ELECTRON TEMPERATURE; ELECTRON ENERGY DISTRIBUTION FUNCTION; INDUCTIVELY COUPLED PLASMA SOURCES; LANGMUIR PROBES; PLASMA POTENTIAL;

PLASMAS;

EID: 0031101854     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.55.3450     Document Type: Article

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