Correct height measurement in noncontact atomic force microscopy

Physical Review Letters

Volumn 91, Issue 26, 2003, Pages

  Sadewasser, Sascha ^a   Lux Steiner, Martha Ch ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHITE;

ATOMIC FORCE MICROSCOPY; CHEMISTRY; PROCEDURES; STATIC ELECTRICITY;

GRAPHITE; MICROSCOPY, ATOMIC FORCE; STATIC ELECTRICITY;

ATOMIC FORCE MICROSCOPY; CAPACITANCE; COMPUTER SIMULATION; ELECTRIC POTENTIAL; ELECTROSTATICS; FULLERENES; GRAPHITE; NATURAL FREQUENCIES; RESONANCE; SURFACE TOPOGRAPHY; VAN DER WAALS FORCES;

CONTACT POTENTIAL; ELECTROSTATIC FORCES; SPRING CONSTANT;

SURFACE MEASUREMENT;

EID: 1042265917     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.91.266101     Document Type: Article

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