High-sensitivity quantitative Kelvin probe microscopy by noncontact ultra-high-vacuum atomic force microscopy

Applied Physics Letters

Volumn 75, Issue 2, 1999, Pages 286-288

  Sommerhalter, Ch ^a   Matthes, Th W ^a   Glatzel, Th ^a   Jager Waldau A ^a   Lux Steiner, M Ch ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000959768     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124357     Document Type: Article

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24. The contrast reversal in Figs. 2(b) and 3(b) also demonstrates that the CP variations along the steps are due to the sample and are not caused by scanning artifacts, such as a shift in the reference potential of an inhomogeneous tip.
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