Atomic-scale variations in contact potential difference on Au/Si(111) 7×7 surface in ultrahigh vacuum

Applied Surface Science

Volumn 157, Issue 4, 2000, Pages 222-227

  Kitamura, Shin'Ichi ^a   Suzuki, Katsuyuki ^a   Iwatsuki, Masashi ^a   Mooney, C B ^b  

^a JEOL LTD   (Japan)

^b JEOL USA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC POTENTIAL; ELECTRONIC DENSITY OF STATES; ELECTROSTATICS; GOLD; IMAGING TECHNIQUES; VACUUM APPLICATIONS;

CONTACT POTENTIAL DIFFERENCE (CPD) IMAGING; NONCONTACT ATOMIC FORCE MICROSCOPY; SCANNING KELVIN PROBE MICROSCOPY (SKPM); WORK FUNCTION;

SILICON;

EID: 0033732005     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00530-9     Document Type: Article

References (4)

1. Weaver J.M.R., Abraham D.W. J. Vac. Sci. Technol. B. 9:1991;1559.
2. Kitamura S., Iwatsuki M. Appl. Phys. Lett. 72:1998;3154.
3. Kitamura S., Suzuki K., Iwatsuki M. Appl. Surf. Sci. 140:1999;265.
4. Kitamura S., Suzuki K., Iwatsuki M. JEOL News. 34E:1999;53.