Electron-beam induced processes and their applicability to mask repair

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 283-292

  Boegli, Volker ^a   Koops, Hans W P ^a   Budach, Michael ^a   Edinger, Klaus ^a   Hoinkis, Ottmar ^a   Weyrauch, Bernd ^a   Becker, Rainer ^a   Schmidt, Rudolf ^a   Kaya, Alexander ^a   Reinhardt, Andreas ^a   Bräuer, Stephan ^a   Honold, Heinz ^b   Bihr, Johannes ^b   Greiser, Jens ^b   Eisenmann, Michael ^b  

^a NaWoTec GmbH   (Germany)

^b LEO GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ETCHING; LIGHT ABSORPTION; MONOLAYERS; NANOSTRUCTURED MATERIALS;

OPAQUE DEFECTS;

MASKS;

EID: 0038303209     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468200     Document Type: Conference Paper

References (10)

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2. T. Liang, et al., "Evaluation of 157nm substrate damage during mask repair", 157nm Lithography Symposium, Dana Point, CA, May 2001.
3. J.W. Coburn and H.F. Winters, "Ion- and electron-assisted gas-surface chemistry - an important effect in plasma etching", J. Appl. Phys. Vol. 50(5), 3189 (1979).
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6. H.W.P. Koops, R. Weiel, D.P. Kern, T.H. Baum, "High Resolution Electron Beam Induced Deposition", Proc. 31. Int. Symp. on Electron, Ion, and Photon Beams, J. Vac. Sci. Technol. B 6(1) (1988) 477
7. J. Frosien, E. Plies «A high performance electron optical column for testing IC's with submicrometer design rules» Microelectronic Engineering 7 ( 1987) 153-162. H. Jaksch «Field emission SEM for true surface imaging and analysis», Marerials Wold, October (1996), and P. Gnauck «A new high resolution field emission SEM with variable pressure capabilities» Proc. EUREM 2000 BRNO, CZ
8. J. Frosien, E. Plies «A high performance electron optical column for testing IC's with submicrometer design rules» Microelectronic Engineering 7 ( 1987) 153-162. H. Jaksch «Field emission SEM for true surface imaging and analysis», Marerials Wold, October (1996), and P. Gnauck «A new high resolution field emission SEM with variable pressure capabilities» Proc. EUREM 2000 BRNO, CZ
9. J. Frosien, E. Plies «A high performance electron optical column for testing IC's with submicrometer design rules» Microelectronic Engineering 7 ( 1987) 153-162. H. Jaksch «Field emission SEM for true surface imaging and analysis», Marerials Wold, October (1996), and P. Gnauck «A new high resolution field emission SEM with variable pressure capabilities» Proc. EUREM 2000 BRNO, CZ
10. V. Boegli, D.P. Kern, "Automatic mark detection in electron beam nanolithography using digital image processing and correlation", J. Vac. Sci. Technol. B 8(6) (1990) 1994