Cr and TaN absorber mask etch CD performance study for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1092-1098

  Zhang, Guojing ^a   Yan, Pei Yang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUVL; EUVL mask; Loading effects

Indexed keywords

CHROMIUM; ETCHING; LITHOGRAPHY; TANTALUM COMPOUNDS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

MASKS;

EID: 0037965841     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468213     Document Type: Conference Paper

References (8)

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