Use of nanomachining for 100 nanometer mask repair

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 909-921

  LoBianco, Bob ^a   White, Roy ^a   Nawrocki, Ted ^a  

^a RAVE LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MACHINING; MASKS; QUARTZ;

NANOMACHINING;

NANOTECHNOLOGY;

EID: 0038642053     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.468628     Document Type: Article

References (1)

1. R. White, " Use of Nanomachining as a Technique to Reduce Scrap of High End Photomasks" SPIE proceeding Session 6 on 10/4/01