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Volumn 4562 II, Issue , 2001, Pages 926-936
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Thin film stress control of absorber stack materials for EUVL reticles
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Author keywords
Extreme Ultra Violet Lithography; Multi layers; Spectroscopic ellipsometry; X ray fluorescence
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Indexed keywords
ELLIPSOMETRY;
FLUORESCENCE;
LIGHT ABSORPTION;
MULTILAYERS;
OPTICAL FILMS;
OPTICAL MULTILAYERS;
OPTICAL VARIABLES MEASUREMENT;
PHOTOLITHOGRAPHY;
SPECTROSCOPIC ANALYSIS;
STRESS ANALYSIS;
THICKNESS MEASUREMENT;
THIN FILMS;
ULTRAVIOLET RADIATION;
X RAY ANALYSIS;
EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL);
MASKS;
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EID: 0035763577
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.458257 Document Type: Article |
Times cited : (1)
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References (7)
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