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Volumn 4562 II, Issue , 2001, Pages 926-936

Thin film stress control of absorber stack materials for EUVL reticles

Author keywords

Extreme Ultra Violet Lithography; Multi layers; Spectroscopic ellipsometry; X ray fluorescence

Indexed keywords

ELLIPSOMETRY; FLUORESCENCE; LIGHT ABSORPTION; MULTILAYERS; OPTICAL FILMS; OPTICAL MULTILAYERS; OPTICAL VARIABLES MEASUREMENT; PHOTOLITHOGRAPHY; SPECTROSCOPIC ANALYSIS; STRESS ANALYSIS; THICKNESS MEASUREMENT; THIN FILMS; ULTRAVIOLET RADIATION; X RAY ANALYSIS;

EID: 0035763577     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458257     Document Type: Article
Times cited : (1)

References (7)
  • 5
    • 0004228622 scopus 로고
    • John Wiley & Sons, New York
    • R. Guenther, Modern Optics, John Wiley & Sons, New York, 1990, p. 52.
    • (1990) Modern Optics , pp. 52
    • Guenther, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.