Near field x-ray lithography simulations for printing fine bridges

Journal of Physics D: Applied Physics

Volumn 36, Issue 20, 2003, Pages 2471-2482

  Bourdillon, Antony J ^a   Boothroyd, Chris B ^b   Williams, Gwyn P ^c   Vladimirsky, Yuli ^a  

^a UhrlMasc Inc   (United States)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; LENSES; MASKS; MICROPROCESSOR CHIPS; MIRRORS; OPTICAL RESOLVING POWER; PRINTING;

DEMAGNIFICATION; PROXIMITY X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0242273446     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/20/008     Document Type: Article

References (31)

1. Bourdillon A J, Williams G P, Boothroyd C B and Vladimirsky Y 2003 Proc. SPIE Microlithography vol 5037, 622-3
2. Bourdillon A J, Boothroyd C B, Kong J R and Vladimirsky Y 2000 J. Phys. D: Appl. Phys. 33 1-9
3. Vladimirsky Y, Bourdillon A J, Vladimirsky O, Jiang W and Leonard Q 1999 J. Phys. D: Appl. Phys. 32 L114-18
4. Kong J R, Vladimirsky Y and Quinn L 2000 Proc. MNE 2000 (Jena, Germany, 18-21 September)
5. Kong J R, Quinn L, Vladimirsky Y and Bourdillon A 2000 Proc. SPIE Microlithography 2000 (Santa Clara, 27 February-3 March)
6. Vladimirsky Y and Bourdillon A J 2002 US Patent No 6383698
7. Solid State Technology February 2000, News Item 43 pp 18-23
8. Proc. International SEMATECH Workshop (Colorado Springs, 7-10 December 1998)
9. Neureuther A R 1980 Microlithography with soft x-rays Synchrotron Radiation Research ed H Winich and S Doniach (New York: Plenum)
10. Vladimirsky Y 1998 Lithography Vacuum Ultraviolet Spectroscopy II chapter 10, pp 205-23
11. J A Samson and D L Ederer (ed) Experimental Methods in the Physical Sciences vol 32 (New York: Academic)
12. Cerrina F 1997 'X-ray lithography' Handbook of Microlithography, Micromachining, and Microfabrication vol 1, ed P Rai-Choudhury (Bellingham: SPIE Press) chapter 3 pp 253-319
13. Krasnoperova A A, Rippstein R, Flamholz A, Kratchmer E, Wind S, Brooks C and Lercel M 1999 Proc. SPIE Conf. vol 3676, pp 24-39
14. Vladimirsky Y 1999 Introduction: limits or limitations Proc. SPIE Conf. 3676, pp xvi-xvii
15. Bourdillon A J and Boothroyd C B 2001 J. Phys. D: Appl. Phys. 34 3209-13
16. Yang L and Taylor J W 2001 J. Vac. Sci. Technol. B 19 129-35
17. Khan M. Han G, Bollepalli S B, Cerrina F and Maldonado J 2000 J. Vac. Sci. Technol. B 17 3426-32
18. Khan M, Han G, Tsvid G, Kitayama T, Maldonado J and Cerrina F 2002 J. Vac. Sci. Technol. B 19 2423-7
19. Vladimirsky O, Dandekar N, Jiang W, Leonard Q, Simon K, Bollepalli S, Vladimirsky Y and Taylor J W 1999 Proc. SPIE Conf. vol 376, p 92
20. Jenkins F A and White H E 1976 Fundamentals of Optics 4th edn (New York: McGraw-Hill)
21. Saxton W O, Pitt T J and Horner M 1979 Ultramicroscopy 4 343
22. Early K, Schattenburg M L and Smith H I 1990 Microelectron. Eng. 11 317-21
23. Chen et al 1998 J. Vac. Sci. Technol. B 16 3521-5
24. Gaeta J et al 2002 Japan J. Appl. Phys. 41 4111-21
25. Forber R A, Chen Z W, Menon R, Grygier R, Mrowka S, Turcu I C E, Gaeta C J, Cassidy K and Smith H I 2002 J. Vac. Sci. Technol. B 20 2984-90
26. Turcu I C E et al 2003 Proc. SPIE Microlithography vol 5037 (23-27 February) at press
27. Vladimirsky Y 2003 Course notes SPIE Short Course on X-ray Lithography
28. Fuji K 1989 US Patent No 4803713
29. Mitsui S and Murooka K 2000 US Patent No 6078641
30. Chen A C 1995 US Patent No 5504793
31. Hasegawa T and Miyachi T 2000 US Patent No 6078640