Imaging capabilities of proximity X-ray lithography at 70 nm ground rules

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 24-39

  Krasnoperova, Azalia A ^a   Rippstein, Robert ^a   Flamholz, Alex ^a   Kratchmer, Ernst ^a   Wind, Shalom ^a   Brooks, Cameron ^a   Lercel, Michael ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; OPTICAL RESOLVING POWER; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; VLSI CIRCUITS;

PROXIMITY X RAY LITHOGRAPHY (PXRL); STEPPERS;

X RAY LITHOGRAPHY;

EID: 0032663135     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351118     Document Type: Conference Paper

References (32)