High-power compact laser-plasma source for X-ray lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4111-4121

  Gaeta, Celestino J ^a   Rieger, Harry ^a   Edmond Turcu, I C ^a   Forber, Richard A ^b   Campeau, Serge M ^b   Cassidy, Kelly L ^b   Powers, Michael J ^a   Maldonado, Juan R ^a   French, Gary ^b   Naungayan, Joseph ^b   Kelsey, Charles ^a   Hark, Peter ^a   Morris, James H ^a   Foster, Richard M ^a   Smith, Henry I ^a   Lim, Michael H ^a  

^a JMAR Technologies Inc   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Diode pumped solid state laser; GaAs semiconductor devices; Laser plasma; X ray lithography; X ray source

Indexed keywords

LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PUMPING (LASER); SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DIODES; X RAYS;

X-RAY SOURCES;

X RAY LITHOGRAPHY;

EID: 0036614305     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4111     Document Type: Article

References (10)