Can proximity x-ray lithography print 35 nm features? Yes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2423-2427

  Khan, Mumit ^a   Han, Geng ^a   Tsvid, Gene ^a   Kitayama, Toyoki ^b   Maldonado, Juan ^c   Cerrina, Franco ^a  

^a University of Wisconsin Madison   (United States)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

^c Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; DIFFRACTION; IMAGE ANALYSIS; PHOTOELECTRON SPECTROSCOPY; PHOTONS; PHOTORESISTS; RADIATION EFFECTS;

ENERGY SPECTRUM; HIGH ENERGY RADIATION; IMAGE MODULATION; PHOTOELECTRON ENERGY; PROXIMITY X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0035519801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1418407     Document Type: Article

References (12)

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