Extension of x-ray lithography to 50 nm with a harder spectrum

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3426-3432

  Khan, Mumit ^a   Han, Geng ^a   Bollepalli, Srinivas B ^a   Cerrina, Franco ^a   Maldonado, Juan ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033261111     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591024     Document Type: Article

References (12)

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12. F. Cerrina, Proc. IEEE 85, 544 (1997).