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Journal of Physics D: Applied Physics

Volumn 34, Issue 22, 2001, Pages 3209-3213

Proximity correction simulations in ultra-high resolution x-ray lithography

(2) Bourdillon, A J a Boothroyd, C B a

a NONE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTIMIZATION; SILICON CARBIDE; SILICON NITRIDE; SYNCHROTRON RADIATION; TANTALUM COMPOUNDS; TWO DIMENSIONAL;

DEMAGNIFICATION; PROXIMITY CORRECTION SIMULATION; TWO-DIMENSIONAL PROXIMITY CORRECTION; ULTRA-HIGH RESOLUTION X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0035930159 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/22/301 Document Type: Article

Times cited : (16)

References (11)

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2
- 0033277045
- (1999) J. Phys. D: Appl. Phys. , vol.32
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3
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- Proc. MNE 2000 (Jena, Sept. 18-21), Germany
- Kong, J.R.¹ Vladimirsky, Y.² Quinn, L.³

4
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- February; News Item
- (2000) Solid State Technology , pp. 18-23

5
- 0242312528
- Microlithography with soft x-rays
- ed H Winich and S Doniach (New York: Plenum)
- Synchrotron Radiation Research
- Neureuther, A.R.¹

6
- 77956667883
- Lithography vacuum ultraviolet spectroscopy II
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- (1998) (Experimental Methods in the Physical Sciences) , vol.32 , pp. 205-223
- Vladimirsky, Y.¹

7
- 0001384270
- X-ray lithography
- ed P Rai-Choudhury (Bellingham, Washington: SPIE)
- (1997) Handbook of Microlithography, Micromachining, and Microfabrication , vol.1 , pp. 253-319
- Cerrina, F.¹

8
- 0032663135
- (1999) Proc. SPIE , vol.3676 , pp. 24-39
- Krasnoperova, A.A.¹ Rippstein, R.² Flamholz, A.³ Kratchmer, E.⁴ Wind, S.⁵ Brooks, C.⁶ Lercel, M.⁷

9
- 0001778181
- Introduction: Limits or limitations
- (1999) Proc. SPIE , vol.3676
- Vladimirsky, Y.¹

10
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11
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- Saxton, W.O.¹ Pitt, T.J.² Horner, M.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.