Study of X-ray phase-shifting masks for sub-70 nm patterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 1, 2001, Pages 129-135

  Yang, Lei ^a   Taylor, James W ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; PHASE SHIFTERS; PHOTORESISTS; SILICON NITRIDE; SYNCHROTRONS; THERMODYNAMIC STABILITY; X RAY LITHOGRAPHY;

X RAY PHASE MASKS (XPM);

MASKS;

EID: 0035087931     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1338556     Document Type: Article

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