10. Lithography

Experimental Methods in the Physical Sciences

Volumn 32, Issue C, 1998, Pages 205-223

  Vladimirsky, Yuli ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77956667883     PISSN: 10794042     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S0076-695X(08)60283-5     Document Type: Article

References (31)

1. Thompson L.F. "An Introduction to Lithography,". In: Thompson L.F., Wilson C.G., and Bowden M.J. (Eds). Introduction to Micro-lithography. Second edition (1994), American Chemical Society, Washington, DC 1-17
2. Voltmer F.W. "Manufacturing Process Technology for MOS VLSI,". In: Einspruch N.G. (Ed). VLSI Electronics, Microstructure Science 1 (1981), Academic Press 2-40
3. Prince J.L. "VLSI Device Fundamentals,". In: Barbe D.F. (Ed). Very Large Scale Integration (VLSI) Fundamentals and Applications (1982), Springer-Verlag 4-41
4. The National Technology Roadmap for Semiconductors (1997), Semiconductor Industry Association (SIA) publication 14
5. Cerrina F. "X-Ray Lithography,". In: Rai-Choudhury P. (Ed). Handbook of Microlithography, Micro-machining, and Microfabrication 1 (1997), SPIE Press, Bellingham, Washington 253-319
6. Broers A.N., and Chang T.H.P. "High Resolution Lithography for Microcircuits,". In: Ahmed H., and Nixon W.C. (Eds). Microcircuit Engineering (1980), Cambridge University Press 1-74
7. The Encyclopedia Americana 17 (1985), Groiler Incorporated, Danbury, Connecticut 585
8. Wilson C.G. "Organic Resist Materials,". In: Thompson L.F., Wilson C.G., and Bowdcn M.J. (Eds). Introduction to Microlithography. Second edition (1994), American Chemical Society, Washington, DC 139-267
9. Lane J.G. "Resists for storage ring x-ray lithography,". Procc. SPIE 448 (1983) 119-129
10. Allen R.D., Conley W.E., and Kunz R.R. "Deep-UV Resist Technology: The Evolution of Materials and Processes for 250-nm Lithography and Beyond,". In: Rai-Choudhury P. (Ed). Handbook of Microlithography, Micromachining, and Microfabrication 1 (1997), SPIE Press, Bellingham, Washington, USA 312-375
11. Levinson H.J., and Arnold W.H. "Optical Lithography,". In: Rai-Choudhury P. (Ed). Handbook of Micro-lithography, Micromachining, and Microfabrication 1 (1997), SPIE Press, Bellingham, Washington 11-141
12. Boudcn M.J. "The Lithographic Process: The Physics,". In: Thompson L.F., Wilson C.G., and Bowden M.J. (Eds). Introduction to Micro-lithography. Second edition (1994), American Chemical Society, Washington, DC 20-138
13. Born M., and Wolf E. Principles of Optics (1980), Pergamon Press
14. Lin B.J. "Optical Methods for Fine Line Lithography,". In: Newman R. (Ed). Fine Line Lithography (1980), North-Holland Publishing Company 105-232
15. Vladimirsky Y., Saile V., Scott J.D., Vladimirsky O., Morris H., Klopf J.M., Calderon G., Bluem H.P., and Craft B.C. "X-Ray Lithography Program at CAMD,". The Electrochemical Society Proceedings 95-18 (1996) 366-375
16. Ruff B., Tai E., and Brown R. "Broadband deep-UV high NA photolithography system,". Proc. SPIE 1088 (1989) 441-446
17. Jain K., Wilson C.G., and Lin B.J. "Ultrafast high resolution contact lithography using excimcr lasers,". Proc. SPIE 334 (1982) 259-262
18. Jain K., and Kerth R.T. "Excimer laser projection lithography,". Appl. Opt. 23 5 (1984) 648-650
19. Pol V., Bennewitz II J., Escher G.C., Feldman M., Firtion V.A., Jewel T.E., Wilcomb B.E., and Clemens J.T. "Excimer laser-based lithography: a deep ultraviolet wafer stepper,". Proc. SPIE 633 (1986) 6-16
20. Hollman R.F., Cleveland F., Da Silvera E.M., McCleary R.W., and Strauten R.W. "Design and performance of a production-oriented deep UV stepper,". Proc. SPIE 1264 (1990) 548-555
21. McCTearly W., Tompkims P.J., Dunn M.D., Walsh K.F., Conway J.F., and Mueller R.P. "Performance of a KrF laser stepper,". Proc. SPIE 922 (1988) 396-399
22. Lin B.J. "Methods to print optical images at low-fti factors,". Proc. SPIE 1264 (1990) 2-13
23. Spiller E. "Early history of x-ray lithography at IBM,". IBM J own. Res. Devel. 37 (1993) 291-297
24. Spiller E., and Feder R. "X-ray lithography,". In: Queisser H.J. (Ed). X-ray Optics Application to Solids, Topics in Applied Physics 22 (1977), Springer-Verlag 36-92
25. Spears D., and Smith H.I. "High-resolution pattern replication using soft x-rays,". Electr. Lett. 8 (1972) 102-104
26. Vladimirsky Y., and Maldonado J. "Illumination Effects of Image Formation in X-ray Proximity Printing,". Microcircuit Engineering 90 (1991), North-Holland 343-346
27. Vladimirsky Y., Scott J.D., and Bhattacharia P.K. "Ionization Radiation Effects and Mechanisms,". Mat. Res. Soc. Symp. Proc. 306 (1993) 21-27
28. Lepselter M.P., and Lynch W.T. "Resolution Limitations for Submicron Lithography". In: Einspruch N.G. (Ed). VLSI Electronics, Microstructure Science 1 (1981), Academic Press 83-127
29. Watts R.K. "Advanced Lithography,". In: Barbe D.F. (Ed). Very Large Scale Integration (VLSI) Fundamentals and Applications (1982), Springer-Verlag 42-88
30. Chen Z., Leonard Q., and Cerrina F. "X-ray Phase-Shifting Mask: Nanostructures,". Proc. SPIE 3048 (1997) 183-192
31. Spiller E. "Soft X-ray Optics," (1994), SPIE Press, Bellingham, Washington 256-258