Paramagnetic defects in undoped microcrystalline silicon deposited by the hot-wire technique

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 793-798

  Kanschat, P ^a   Lips, K ^a   Brueggemann, R ^a   Hierzenberger, A ^a   Sieber, I ^a   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON SPIN RESONANCE SPECTROSCOPY; ELECTRONIC PROPERTIES; MORPHOLOGY; PARAMAGNETISM; SEMICONDUCTING FILMS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SEMICONDUCTING SILICON;

EID: 0032634463     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)