High resolution surface analysis of Si roughening in dilute ammonium fluoride solution

Journal of Electroanalytical Chemistry

Volumn 540, Issue , 2003, Pages 3-6

  Lewerenz, H J ^a   Aggour, M ^b   Murrell, C ^a   Jakubowicz, J ^a   Kanis, M ^a   Campbell, S A ^c   Cox, P A ^c   Hoffmann, P ^d   Jungblut, H ^a   Schmeisser D ^d  

^a HAHN MEITNER INSTITUT   (Germany)

^b IBN TOFAIL UNIVERSITY   (Morocco)

^c UNIVERSITY OF PORTSMOUTH   (United Kingdom)

^d BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AFM; Electropolishing; Photoelectron spectroscopy; Porous Si; Synchrotron radiation

Indexed keywords

AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; BINDING ENERGY; ELECTROLYTIC POLISHING; PHOTOCURRENTS; PHOTOELECTRON SPECTROSCOPY; PROBABILITY DENSITY FUNCTION; SILICON; SOLUTIONS; SURFACE ROUGHNESS; SYNCHROTRON RADIATION;

DISSOLUTION MODELS;

ELECTROCHEMISTRY;

EID: 0037413679     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(02)01210-X     Document Type: Article

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