Determination of the hardness and elastic modulus of low-k thin films and their barrier layer for microelectronic applications

Microelectronic Engineering

Volumn 70, Issue 1, 2003, Pages 115-124

  Shen, Lu ^a   Zeng, Kaiyang ^a   Wang, Yihua ^b   Narayanan, Babu ^b   Kumar, Rakesh ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Elastic modulus; Hardness; Low k dielectric thin film; Nano indentation

Indexed keywords

DIELECTRIC FILMS; ELASTIC MODULI; HARDNESS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

BARRIER LAYERS;

MICROELECTRONIC PROCESSING;

EID: 0141843695     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00413-1     Document Type: Article

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