The vortex via process: Analysis and mask fabrication for contact CDs < 80 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 344-370

  Levenson, Marc D ^a   Tan, Sze M ^b   Dai, Grace ^c   Morikawa, Yasutaka ^d   Hayashi, Naoya ^d   Ebihara, Takeaki Joe ^e  

^a MD Levenson Consulting   (United States)

^b UNIVERSITY OF AUCKLAND   (New Zealand)

^c Sigma C   (United States)

^d DNP Ltd   (Japan)

^e NEC Corporation of America   (United States)

Author keywords

Contact; Double exposure; Optical vortex; PSM; Via

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; MASKS; MATHEMATICAL MODELS; SEMICONDUCTOR DEVICE MANUFACTURE;

AERIAL IMAGES; MASK FABRICATION; OPTICAL AMPLITUDE; OPTICAL VORTEX;

PHOTORESISTS;

EID: 0141831723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485418     Document Type: Conference Paper

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