3D electromagnetic field simulation for low-k1 lithography

Microlithography World

Volumn 10, Issue 1, 2001, Pages 5-6,-8,-10

  Erdmann, Andreas ^a   Gordon, Ron ^a   McCallum, Martin ^a   Rosenbusch, Anja ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; FINITE DIFFERENCE METHOD; MASKS; MAXWELL EQUATIONS; PHOTORESISTS; REFRACTIVE INDEX; TIME DOMAIN ANALYSIS;

ELECTROMAGNETIC FIELD SIMULATION; OPTIMAL PROXIMITY CORRECTION; PHASE SHIFTING MASKS; PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 0034824927     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (13)