Improving Resolution in Photolithography with a Phase-Shifting Mask

IEEE Transactions on Electron Devices

Volumn 29, Issue 12, 1982, Pages 1828-1836

  Levenson, Marc D ^a   Viswanathan, N S ^a   Simpson, Robert A ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS - MASKS;

LITHOGRAPHY;

EID: 0020249292     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1982.21037     Document Type: Article

References (10)

1. M. Born and E. Wolf, Principles of Optics, 5th ed. Oxford, England: Pergamon Press, 1975, p. 370 ff.
2. B. J. Lin, “Optical methods for fine line lithography,” in Fine Line Lithography, R. Newman, Ed. Amsterdam: North Holland, 1980, pp. 107–230.
3. J. W. Goodman, Introduction to Fourier Optics. San Francisco: McGraw-Hill, 1968, pp. 128–131.
4. J. D. Cuthbert, Solid State Technol., vol. 20, pp. 59–69, 1977.
5. B. J. Lin, “Partially coherent imaging in two dimensions and the theoretical limits of projection printing in microfabrication,” IEEE Trans. Electron Devices, vol. ED-27, pp. 931–938, 1980.
6. C. J. Bouwkamp, Rep. Progr. Phys., vol. 17, p. 39, 1954 and references therein.
7. M. J. Born and E. Wolf, Principles of Optics. pp. 128–130.
8. G.R.M. Thomas, H. L. Coleman, and M. Lanahan, “Use of 436 nm optical step-and-repeat imaging for wafer fabrication,” in SPIE Proc., vol. 174, Developments in Semiconductor Microlithography IV, pp. 15–21, 1979.
9. D. S. Goodman, “Stationary optical projectors,” Ph.D. dissertation, University of Arizona, 1979.
10. G. R. Brewer, Electron Beam Technology in Microelectronic Fabrication. New York: Academic Press, 1980.