Plasma etching of Cr: A multiparameter uniformity study utilizing patterns of various Cr loads

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 153-157

  Constantine, C ^a   Westerman, R J ^a   Plumhoff, J ^a  

^a Qualtx Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; PLASMA ETCHING; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION (CD) UNIFORMITY; OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0032670074     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360203     Document Type: Conference Paper

References (5)