PREVAIL-EPL alpha tool: Early results

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2459-2467

  Golladay, S D ^a   Pfeiffer, H C ^a   Bohnenkamp, C A ^a   Dhaliwal, R S ^a   Enichen, W A ^a   Gordon, M S ^a   Kendall, R A ^a   Lieberman, J E ^a   Stickel, W ^a   Rockrohr, J D ^a   Tressler, E V ^a   Tanimoto, A ^b   Yamaguchi, T ^b   Okamoto, K ^b   Suzuki, K ^b   Miura, T ^b   Okino, T ^b   Kawata, S ^b   Morita, K ^b   Suzuki, S C ^b   Shimizu, H ^b   Kojima, S ^b   Varnell, G ^c   Novak, W T ^c   Sogard, M ^c   more..

^a IBM MICROELECTRONICS   (United States)

^b NIKON CORPORATION   (Japan)

^c Nikon Res Corporation of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRON BEAM STEPPER; ELECTRON OPTICAL SUBSYSTEM;

ELECTRON OPTICS;

EID: 0001105194     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1415501     Document Type: Article

References (14)

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