Mask blank fabrication, pattern transfer, and mounting distortion simulations for the 8-in. Format SCALPEL mask

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 433-438

  Dicks, G ^a   Engelstad, R ^a   Lovell, E ^a   Liddle, J ^b  

^a University of Wisconsin Madison   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

Electron beam lithography; Mask distortions; Modeling; SCALPEL

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; MASKS; MEMBRANES; SUBSTRATES;

MASK BLANK FABRICATION; MASK DISTORTIONS;

MICROELECTRONICS;

EID: 0035450722     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00461-0     Document Type: Article

References (6)