Patterning-induced image placement distortions on electron beam projection lithography membrane masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2671-2677

  Lercel, Michael ^a   Magg, Christopher ^a   Lawliss, Mark ^a   Williams, Carey ^a   Caldwell, Neal ^a   Ackel, Robin ^a   Kindt, Louis ^a   Racette, Kenneth ^a   Reu, Phillip ^b   Engelstad, Roxann ^b   Mackay, R Scott ^c  

^a IBM   (United States)

^b University of Wisconsin Madison   (United States)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FINITE ELEMENT METHOD; INTEGRATED CIRCUIT LAYOUT; SILICON WAFERS; STATIC RANDOM ACCESS STORAGE;

CHARGED PARTICLE LITHOGRAPHY; PATTERN DENSITY GRADIENTS; PATTERNING INDUCED IMAGE PLACEMENT DISTORTIONS; STENCIL MASKS;

MASKS;

EID: 0000623018     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1409381     Document Type: Article

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