Modeling mask fabrication and pattern transfer distortions for EPL stencil masks

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 467-473

  Reu, P ^a   Engelstad, R ^a   Lovell, E ^a   Magg, C ^b   Lercel, M ^b  

^a University of Wisconsin Madison   (United States)

^b Mask Cent of Competency   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ETCHING; LITHOGRAPHY; SENSITIVITY ANALYSIS; STRESS ANALYSIS;

PATTERN TRANSFER DISTORTIONS;

MASKS;

EID: 0035450051     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00470-1     Document Type: Article

References (3)

1. Predicting mechanical distortions in X-ray masks
2. Pattern transfer distortions in IPL and EPL masks with pattern density gradients