PREVAIL: Dynamic correction of aberrations

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3079-3083

  Gordon, M S ^a   Enichen, W A ^a   Golladay, S D ^a   Pfeiffer, H C ^a   Robinson, C F ^a   Stickel, W ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; DISTORTION (WAVES); IMAGE QUALITY; MATRIX ALGEBRA; OPTICAL INSTRUMENT LENSES; WSI CIRCUITS;

FEATURE ASTIGMATISM; SUBFIELD DISTORTIONS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034314696     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319710     Document Type: Article

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