Predicting overlay performance for electron projection lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 547-558

  Reu, Phillip L ^a   Chen, Cheng Fu ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Lercel, Michael J ^b   Wood II, Obert R ^c   Mackay, R Scott ^c  

^a University of Wisconsin Madison   (United States)

^b IBM MICROELECTRONICS   (United States)

^c SEMATECH   (United States)

Author keywords

Electron projection lithography; EPL masks; Finite element analysis; Pattern transfer distortions

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; FABRICATION; FINITE ELEMENT METHOD; STRESS ANALYSIS;

ELECTRON PROJECTION LITHOGRAPHY (EPL);

MASKS;

EID: 0036378994     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472280     Document Type: Article

References (14)

1. National Technology Roadmap for Semiconductors, Semiconductor Industry Association, 2001.
2. M. Sprague, W. Semke, R. Engelstad, E. Lovell, A. Chalupka, H. Löschner and G. Stengl, "Stencil mask distortion control using nonsymmetric perforation rings, " Microelectronic Engineering, 41/42, pp. 225-228, 1998.
3. P. Reu, C.-f. Chen, R. Engelstad, E. Lovell, T. Bayer, J. Greschner, S. Kalt and H. Weiss, "Novel EPL mask format layer stress measurement and simulation of pattern transfer distortions, " to be presented at the 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2002.
4. P. Reu, R. Engelstad, E. Lovell, C. Magg, M. Lercel and R. Mackay, "Simulating the effects of pattern density gradients on electron-beam projection lithography pattern transfer distortions, " J. Vac. Sci. Tech. B, 19, No. 6, pp. 2652-2658, 2001.
5. C.-f. Chen, R. Engelstad, E. Lovell and A. Novembre, "Simulating the response of electron-beam projection lithography under standardized mounting techniques, " J. Vac. Sci. Tech. B, 19, No. 6, pp. 2646-2651, 2001.
6. M. Lercel, C. Magg, M. Lawliss, C. Williams, N. Caldwell, R. Ackel, L. Kindt, K. Racette, P. Reu, R. Engelstad and R. Mackay, "Patterning-induced image placement distortions on electron beam projection lithography membrane masks, " J. Vac. Sci. Tech. B, 19, No. 6, pp. 2671-2677, 2001.
7. P. Reu, R. Engelstad, E. Lovell, K. Racette and M. Lercel, "Characterizing thin film stress distributions using resonant frequency techniques, " to be appear in the Proceedings of the Society of Experimental Mechanics (SEM), 2002.
8. Drawing courtesy of P.-T. Lee, University of Wisconsin - Computational Mechanics Center, 2002.
9. C. Magg, Private Communications, 2000.
10. E. Cotte, R. Engelstad, E. Lovell and C. Brooks, "Predicting mechanical distortions in x-ray masks, " Proceedings of the 1999 SPIE Symposium on Emerging Lithographic Technologies III, 3676, pp. 429-440, 1999.
11. G. Frisque, E. Lovell and R. Engelstad, "Pattern transfer distortions in IPL and EPL masks with pattern density gradients, " Proceedings of the 2000 SPIE Symposium on Emerging Lithographic Technologies IV, 3997, pp. 568-577, 2000.
12. G. Frisque, R. Tejeda, E. Lovell and R. Engelstad, "Finite element modeling of ion-beam lithography masks for pattern transfer distortions, " Proceedings of the 1999 SPIE Symposium on Emerging Lithographic Technologies III, 3676, pp. 768-778, 1999.
13. P. Reu, "Comparative analysis of next generation lithography masks: PREVAIL and SCALPEL technologies, " Ph.D. Dissertation, Mechanical Engineering, University of Wisconsin, Madison, WI 2001.
14. M. Schlax, R. Engelstad, E. Lovell, C. Brooks and C. Magg, "Comparison of substrate curvature and resonant frequency thin film stress mapping techniques, " Proceedings of the 2000 SPIE Symposium on Emerging Lithographic Technologies IV, 3997, pp. 539-548, 2000.