Pattern transfer distortions in IPL and EPL masks with pattern density gradients

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 568-577

  Frisque, Gary A ^a   Lovell, Edward G ^a   Engelstad, Roxann L ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FINITE ELEMENT METHOD; ION BEAM LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRON BEAM PROJECTION LITHOGRAPHY; ION BEAM PROJECTION LITHOGRAPHY; PATTERN TRANSFER DISTORTIONS;

MASKS;

EID: 0033683285     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)