Simulating the mechanical response of electron-beam projection lithography masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3248-3253

  Jachim, A F ^a   Chen, C F ^a   Engelstad, R L ^a   Lovell, E G ^a   Mangat, P J S ^b   Dauksher, W J ^b  

^a University of Wisconsin Madison   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELASTICITY; FINITE ELEMENT METHOD; GRAVITATIONAL EFFECTS; MASKS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SINGLE CRYSTALS;

IMAGE PLACEMENT ERRORS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034315950     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1313574     Document Type: Article

References (4)

1. J. F. Nye, Physical Properties of Crystals (Clarendon, Oxford, 1985).
2. J. J. Wortman, J. Appl. Phys. 36, 153 (1965).
3. W. A. Brantley, J. Appl. Phys. 44, 534 (1973).
4. G. A. Dicks, Ph.D. thesis, University of Wisconsin-Madison, 2000.