Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1286-1290

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Bokor, Jeffrey ^a,b   Gullikson, Eric ^a   Harteneck, Bruce ^a   Jackson, Keith ^a   Olynick, Deirdre ^a   Salmassi, Farhad ^a   Baker, Sherry ^c   Mirkarimi, Paul ^c   Spiller, Eberhard ^c   Walton, Chris ^c   Zhang, Guojing ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAM ASSISTED DEPOSITION; MASKS; MULTILAYERS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LITHOGRAPHY;

EID: 0141458296     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1580839     Document Type: Conference Paper

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