Adsorption and thermal decomposition of diethylaluminum hydride on Si(1 0 0)-2 × 1

Surface Science

Volumn 542, Issue 3, 2003, Pages 167-176

  Bulanin, Kirill M ^a   Kong, Maynard J ^b   Pirolli, Laurent ^a   Mathauser, Anna T ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b PONTIFICIA UNIVERSIDAD CATÓLICA DEL PERÚ   (Peru)

Author keywords

Adsorption kinetics; Hydrides; Silicon; Thermal desorption

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DESORPTION; ETHYLENE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRIDES; MASS SPECTROMETRY; MONOLAYERS; PYROLYSIS; REACTION KINETICS; SURFACE REACTIONS;

THERMAL DESORPTION;

ADSORPTION;

EID: 0042785201     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)01025-2     Document Type: Article

References (56)

1. Levy R.A., Green M.L., Gallagher P.K. J. Electrochem. Soc. 131:1984;2175-2182.
2. Green M.L., Levy R.A., Nuzzo R.G., Coleman E. Thin Solid Films. 114:1984;367-377.
3. Higashi G.S., Fleming C.G. Appl. Phys. Lett. 48:1986;1051-1053.
4. Zhang Y., Stuke M. Chem. Phys. Lett. 149:1988;310-315.
5. Jones A.C., Rushworth S.A., Auld J. J. Cryst. Growth. 146:1995;503-510.
6. Motooka T., Gorbatkin S., Lubben D., Greene J.E. J. Appl. Phys. 58:1985;4397-4401.
7. Ehrlich D.J., Osgood R.M. Jr. Chem. Phys. Lett. 79:1981;381-388.
8. Higashi G.S., Rothberg L.J. Appl. Phys. Lett. 47:1985;1288-1290.
9. Itoh H., Watanabe M., Mukai S., Yajima H. J. Cryst. Growth. 93:1988;165-169.
10. Eres D., Motooka T., Gorbatkin S., Lubben D., Greene J.E. J. Vac. Sci. Technol. B. 5:1987;848-852.
11. Masu K., Tsobouchi K., Shigeeda N., Matano T., Mikoshiba N. Appl. Phys. Lett. 56:1990;1543.
12. Zhou Y., Henderson M.A., White J.M. Surf. Sci. 221:1989;160-182.
13. Tsubouchi K., Masu K., Shigeeda N., Matano T., Hiura Y., Mikoshiba N. Appl. Phys. Lett. 57:1990;1221-1223.
14. Kondoh E., Ohta T. J. Vac. Sci. Technol. A. 13:1995;2863-2871.
15. Hanabusa M., Hayakawa K., Oikawa A., Maeda K. Jpn. J. Appl. Phys., Part 2. 27:1988;L1392-L1394.
16. Tsubouchi K., Masu K. J. Vac. Sci. Technol. A. 10:1992;856-862.
17. Mitsui T., Hill E., Curtis R., Ganz E. Phys. Rev. B. 59:1999;8123-8127.
18. Gross M.E., Cheung K.P., Fleming C.G., Kovalchick J., Heimbrook L.A. J. Vac. Sci. Technol. A. 9:1991;57-64.
19. Gross M.E., Fleming C.G., Cheung K.P., Heimbrook L.A. J. Appl. Phys. 69:1991;2589-2592.
20. Gross M.E., Cheung K.P., Fleming C.G., Kovalchick J., Heimbrook L.A. J. Vac. Sci. Technol. A. 9:1991;57-64.
21. Elms F.M., Lamb R.N., Pigram P.J., Gardiner M.G., Wood B.J., Raston C.L. Chem. Mater. 6:1994;1059-1066.
22. Simmonds M.G., Taupin I., Gladfelter W.L. Chem. Mater. 6:1994;935-942.
23. Beach D.B., Blum S.E., LeGoues F.K. J. Vac. Sci. Technol. A. 7:1989;3117-3118.
24. Kim B.-Y., Li X.D., Rhee S.-W. Appl. Phys. Lett. 68:1996;3567-3569.
25. Simmonds M.G., Gladfelter W.L., Nagaraja R., Szymanski W.W., Ahn K.-H., McMurry P.H. J. Vac. Sci. Technol. A. 9:1991;2782-2784.
26. Yun J.-H., Kim B.-Y., Rhee S.-W. Thin Solid Films. 312:1998;259-264.
27. Jang T.W., Moon W., Baek J.T., Ahn B.T. Thin Solid Films. 333:1998;137-141.
28. Shen T.-C., Wang C., Tucker J.R. Appl. Surf. Sci. 141:1999;228-236.
29. Tsubouchi K., Masu K. Vacuum. 46:1995;1249-1253.
30. McGrew C.E. Solid State Technology. 40:1997;193-194. 196, 199, 200.
31. Zhang Y., Stuke M. J. Cryst. Growth. 93:1988;143-150.
32. Zhang Y., Stuke M. J. Phys. Chem. 93:1989;4503-4507.
33. Kong M.J., Lee S.S., Lyubovitsky J., Bent S.F. Chem. Phys. Lett. 263:1996;1-7.
34. Du W., Keeling L.A., Greenlief C.M. J. Vac. Sci. Technol. A. 12:1994;2281-2286.
35. Coon P.A., Wise M.L., Dillon A.C., Robinson M.B., George S.M. J. Vac. Sci. Technol. B. 10:1992;221-227.
36. Coon P.A., Wise M.L., Walker Z.H., George S.M. Surf. Sci. 291:1993;337-348.
37. Sampson G.M., White J.M., Ekerdt J.G. Surf. Sci. 411:1998;163-175.
38. Keeling L.A., Chen L., Greenlief C.M., Mahajan A., Bonser D. Chem. Phys. Lett. 217:1994;136-141.
39. Klug D.-A., Greenlief C.M. J. Vac. Sci. Technol. A. 14:1996;1826-1831.
40. Colaianni M.L., Chen P.J., Gutleben H., Yates J.T. Chem. Phys. Lett. 191:1992;561-568.
41. Darlington B., Foster M., Campion A. Surf. Sci. Lett. 304:1994;L407-L412.
42. Foster M., Darlington B., Scharff J., Campion A. Surf. Sci. 375:1997;35-44.
43. NIST Chemistry Webbook, The National Institute of Standards and Technology (2003), Available from < http://webbook.nist.gov/chemistry/>.
44. Gow T.R., Lin R., Cadwell L.A., Lee F., Backman A.L., Masel R.I. Chem. Mater. 1:1989;406-411.
45. Gow T.R., Lee F., Lin R., Backman A.L., Masel R.I. Vacuum. 41:1990;951-954.
46. Strongin D.R., Comita P.B. J. Phys. Chem. 95:1991;1329-1333.
47. Willis B.G., Jansen K.F. Surf. Sci. 488:2001;286-302.
48. Hiraoka Y., Mashita M. J. Cryst. Growth. 145:1994;473.
49. Bulanin K.M., Shah A.G., Teplyakov A.V. J. Chem. Phys. 115:2001;7178-7195.
50. Hovis J.S., Liu H., Hamers R.J. Surf. Sci. 402-404:1998;1-7.
51. Bulanin K.M., Shah A.G., Fitzgerald D.R., Doren D.J., Teplyakov A.V. J. Phys. Chem. B. 106:2002;7286-7289.
52. CRC Handbook of Chemistry and Physics. 77th ed., 1996-1997.
53. Schwennicke C., Wang X.-S., Einstein T.L., Williams E.D. Surf. Sci. 418:1998;22-31.
54. Go E.P., Thuermer K., Reutt-Robey J.E. Surf. Sci. 437:1999;377-385.
55. Go E.P., Thuermer K., Reutt-Robey J.E. J. Phys. Chem. B. 104:2000;8507-8511.
56. Breisacher P., Siegel B. J. Am. Chem. Soc. 86:1964;5053-5054.