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Volumn 488, Issue 3, 2001, Pages 286-302

Disproportionation of dimethylalane on aluminum surfaces. Part I. Experimental studies

Author keywords

Aluminum; Chemical vapor deposition; Growth; Metallic films; Molecule solid reactions; Surface chemical reaction; Thermal desorption

Indexed keywords

ADSORPTION; ALUMINUM; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DEHYDROGENATION; METALLIC FILMS; ORGANOMETALLICS; SURFACE REACTIONS; TEMPERATURE PROGRAMMED DESORPTION;

DIMETHYLALUMINUM HYDRIDE; SURFACE DISPROPORTIONATION MECHANISMS;

ALUMINUM COMPOUNDS;

EID: 0035839222 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01068-8 Document Type: Article

Times cited : (4)

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