Microstructure and deposition rate of aluminum thin films from chemical vapor deposition with dimethylethylamine alane

Applied Physics Letters

Volumn 68, Issue 25, 1996, Pages 3567-3569

  Kim, Byoung Youp ^a   Li, Xiaodong ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001239821     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116639     Document Type: Article

References (10)

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