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Volumn 36, Issue 11 SUPPL. B, 1997, Pages
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Controlling fluorine concentration of fluorinated amorphous carbon thin films for low dielectric constant interlayer dielectrics
a
a
NEC CORPORATION
(Japan)
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Author keywords
Amorphous carbon; Interlayer dielectrics; Low dielectric constant; Plasma enhanced chemical vapor deposition
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Indexed keywords
CARBON;
CHEMICAL VAPOR DEPOSITION;
CHEMICAL VARIABLES CONTROL;
DIELECTRIC FILMS;
FLUORINE;
FLUOROCARBONS;
PERMITTIVITY;
PLASMA APPLICATIONS;
PRESSURE CONTROL;
THERMODYNAMIC STABILITY;
THIN FILMS;
INTERLAYER DIELECTRICS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
AMORPHOUS FILMS;
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EID: 5944245313
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.l1531 Document Type: Article |
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Times cited : (29)
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References (6)
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